Purito Seoul Wonder Releaf Centella Daily Sun Lotion (60ml)

The Purito Seoul Wonder Releaf Centella Daily Sun Lotion is the renewed Daily Go To Sunscreen. Formulated with chemical filters to provide exceptionally high, broad-spectrum UVA/UVB protection.Has a fragrance-free and moisturizer-like formula which instantly melts on the skin during application for an easy and even spread. The lightweight texture leaves a dewy finish with no white cast. Free of silicones, sulfates, parabens, PEG, perfume.One of the most important factors of aging and the development of hyperpigmentation and melasma is (excessive) exposure of the sun. We seperate three kinds of uv rays: UVA (UVA1 has a reach off 340-400 naometer and UVA2 has a reach of 320 en 340 nanometer), UVB (320-280 nm) and UVC (280-100 nm). UVC is blocked by the ozon layer, so we aren’t exposed to rays under 280 nm.

Ingredients

Water, Dibutyl Adipate, Propanediol, Dipropylene Glycol, Centella Asiatica Extract(30,108 ppm), Ethylhexyl Triazone, Terephthalylidene Dicamphor Sulfonic Acid, Isododecane, Niacinamide, Sorbitan Sesquioleate, Diethylamino hydroxybenzoyl hexyl benzoate, Tromethamine, Ecklonia Cava Extract, Hyaluronic Acid, Hydrolyzed Hyaluronic Acid, Hydrolyzed Sodium Hyaluronate, Sodium Hyaluronate, Potassium Hyaluronate, Hydroxypropyltrimonium Hyaluronate, Sodium Hyaluronate Crosspolymer, Sodium Acetylated Hyaluronate, Caprylyl Methicone, Glycerin, Bis-Ethylhexyloxyphenol Methoxyphenyl Triazine, Benzotriazolyl Dodecyl p-Cresol, Polysilicone-15, Polymethylsilsesquioxane, Silica, 1,2-Hexanediol, Glyceryl Stearate, Ammonium Acryloyldimethyltaurate/VP Copolymer, Cetearyl Alcohol, Hydroxyacetophenone, Potassium Cetyl Phosphate, Palmitic Acid, Stearic Acid, Polyacrylate Crosspolymer-6, Acrylates/C10-30 Alkyl Acrylate Crosspolymer, Caprylyl Glycol, Dipotassium Glycyrrhizate, Allantoin, Panthenol, Adenosine, Ethylhexylglycerin, Myristic Acid, Butylene Glycol, t-Butyl Alcohol

How To Use

Apply generously 15 minutes before sun exposure.
 Reapply every two hours or as necessary and immediately after extensive sweating.